Speaker
Description
This study investigated the fabrication of microstructures in poly(methyl)methacrylate (PMMA) positive resist using proton beam writing (PBW) technique. PBW is an advanced new direct write microfabrication technique capable of writing high aspect ratio (HAR) structures over a variety of previously studied potential resist materials. In this study 3-MeV proton beam was used at fluences between 101 – 248 nC/mm2 to write 3-dimentional microstructures of different patterns in PMMA. The written molds were subsequently subjected to metallic filling through the use of electroplating technique. The patterns were fabricated onto a PMMA/Cu/Cr/Si multilayer films, in this stack the metallic films were deposited by e-beam evaporation and the polymer was deposited by spin coating method. SEM and AFM analysis revealed the morphology and topography of the written spot-like and gratings patterns, smallest feature detail down to 650 nm with smooth sidewall quality has been achieved. The objective of this study was to optimize PBW technique at i-Themba LABS for high precision microfabrication, for applications in advanced micro/nanoelectromechanical systems (MEMS/NEMS) including microchips, semi-conductors and other device engineering technologies.
| Apply for student award at which level: | MSc |
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| Consent on use of personal information: Abstract Submission | Yes, I ACCEPT |